X-ray Free Electron Lasers (XFELs) are large accelerator-based X-ray sources that produce extremely intense X-ray light in pulses of femtosecond duration. They can be used, for example, for flash photography of macromolecular crystals to decipher how photosynthetic proteins convert and utilize light energy, to generate states in materials that resemble the conditions in the interior of large planets and stars, or to image shock waves and crack propagation. All of these applications require the ability to control the extreme X-ray pulses—to focus or shape them as needed for a particular measurement. Not only must X-ray optics for XFELs be of exquisite precision to obtain the best optical properties but they must also be able to withstand extreme irradiation conditions.
We are exploring the performance of novel diffractive X-ray optics to focus XFEL beams using multilayer Laue lenses (MLLs). High intensities and nanometer spots were demonstrated with both synchrotron and XFEL beams [1,2]. MLLs are based on synthetic multilayer structures and can be fabricated to a precision below 1 Å by magnetron sputtering. We made substantial progress in the preparation of these 3D nanostructured optical elements due to better understanding of the material properties and at-wavelength optical metrology, which is used to characterize their performance. Based on first measurements at the European XFEL, we are currently developing MLLs that are based on new materials and an improved mounting of these lenses. This development is guided by heat load numerical simulations.
[1] S. Bajt et al., Light Sci. Appl. 7, 17162 (2018).
[2] M. Prasciolu et al., SPIE Proc. Vol. 11886, 118860M-1 (2021).